东华大学 理学院 黄晓江 讲师介绍

理学院教职员工网站信息登记

姓名：黄晓江

系别：应用物理系

职称：讲师

职务：无

办公电话：无

电子邮件：huangxj@dhu.edu.cn

办公地址：二号学院楼139

研究方向：低温等离子体物理与应用

男，博士，主讲统计物理等课程

研究成果和其他：

1. Xiaojiang Huang, Liqun Sun , Xinkun Liu, Jing Zhang , Jianjun Shi, “Discharge dynamics and characteristics of atmospheric glow discharge excited by sub-microsecond high voltage pulses”

Thin solid films, 519, 7036-7041, 2011

2. X. J. Huang, L. Q. Sun, J. Z. Xu, J. Zhang， J.J. Shi, “An experimental study on discharge mechanism of pulsed atmospheric pressure glow discharges”

Physics of Plasmas, 18, 033503, 2011

3. Liqun Sun, Xiaojiang Huang, Jie Zhang, Jing Zhang, and J. J. Shi, “Discharge dynamics of pin-to-plate dielectric barrier discharge at atmospheric pressure”

Physics of Plasmas, 17, 113507, 2010

4. Xiao-Jiang Huang, Yu Xin, Lei Yang, Chao Ye, Qiang-Hua Yuan, Zhao-Yuan Ning, “Analysis of optical emission spectroscopy in a dual-frequency capacitively coupled CHF₃ plasma”

Physics of Plasmas, 16, 043509, 2009

5. HUANG Xiao-Jiang, XIN Yu, ZHANG Jie, NING Zhao-Yuan, “Influence of exciting frequency on N₂ and N₂⁺ vibrational temperature of nitrogen capacitively coupled plasma”

Chinese Physics Letters, 26(5), 055202, 2009

6. Chao Ye, Yijun Xu, Xiaojiang Huang, Zhenyu Xing, Jing Yuan, Zhaoyuan Ning, “Effect of low-frequency power on etching of SiOCH low-k film in CHF₃ 13.56MHz/2MHz dual-frequency capacitively coupled plasma”

Microelectronic Engineering,86 421-424, 2009

7. X. J. Huang, Y. Xin, Q.H. Yuan, Z.Y. Ning, “Influence of exciting frequency on gas and ion rotational temperatures of nitrogen capacitively coupled plasma”

Physics of Plasmas, 15, 073501, 2008

8. Xiao-Jiang Huang, Yu Xin, Lei Yang, Quan-Hua Yuan, Zhao-Yuan Ning, “Spectroscopic study on rotational and vibrational temperature of N₂ and N₂⁺ in dual-frequency capacitively coupled plasma”

Physics of Plasmas, 15, 113504, 2008

9. XU Yi-Jun, YE Chao, HUANG Xiao-Jiang, YU Jing, XING Zhen-Yu, NING Zhao-Yuan, “CHF₃ dual-frequency capacitively coupled plasma by optical emission spectroscopy”

Chinese Physics Letters, 25(8) 2942-2945 2008

10. Chao Ye, Yijun Xu, Xiaojiang Huang, Zhaoyuan Ning, “Effect of high-frequency on etching of SiCOH films in CHF₃ dual-frequency capacitively coupled plasmas”

Thin Solid Films, 518 (12), 3223, 2010